Ion Guns:  Model 1450 - 50kV Ion Beam Column

Design Features
  • Adjustable spot size ≥ 5um for spatially defined sputtering or implantation
  • Emission regulated bombardment provides stable ion current
  • Continuously variable beam energy 5kV to 50kV
  • Dual octupole for beam scanning and astigmatism correction
  • Pre-objective scanning for reduced spot size
  • No direct filament to sample line of sight to avoid sample contamination
  • Customer replaceable filaments and beam trimming apertures
  • Dual filaments provide operational backup in case of filament end of life
  • All UHV compatible and etch resistant materials used in fabrication
  • Differential pumping to minimize main chamber gas load
  • Operates over the range of inert gases and Nitrogen

  • Thoria coated Iridium filaments for operation with Oxygen
  • Variable aperture for spot size down to 1um
  • Blanking plates for fast beam pulsing
  • Alkali metal source for operation with Cs, Li, Na, K etc
  • Source oven to permit production of ions of evaporable materials
  • Source with integral Wien filter

Performance @ 50kV, Ar Ions

 Mode  Spot Size (um FWHM)
 Beam Current
 Current Density
 Large Spot
 25  20uA  4
 Medium Spot
 8  5uA  10
 Small Spot
 5  500nA  2.5

Controller Details

  • Input Power 115/230VAC 50/60Hz Autoselect
  • Beam Energy 0-50,000V, 1mA
  • Focus, Condenser 0-40,000V, 1mA
  • Filament Power Emission regulated, 5V, 5A max
  • Ionization Electron accelerating voltage and emission software selectable
  • Ion Extraction 0-2500V software selectable
  • Deflection +/-400VDV supply for +X,-Y,+Y and -Y. Remaining octupole
  • elements supplied from a resistor divider network. Optional
  • 8 channel deflection supply with astigmatism correction and
  • secondary electron imaging capability
  • Interlocks System and auxiliary interlocks
  • User Interface USB based graphic user interface
  • Chassis Dimensions 483(W) x 267(H) x 435 (D) mm. 19 inch rack mount case 6U high
Graphic User Interface